3,4-二氢-4-氧代喹唑啉-8-甲酸甲酯合成路线 （共 4 条）
反应条件
1: With sulfuric acid 48 h; Reflux; 2: With sodium hydroxide T=20°C; pH=~ 8;
参考文献
MERCK PATENT GMBH; SUTTON, Amanda E.; RICHARDSON, Thomas E.; HUCK, Bayard R.; KARRA, Srinivasa R.; CHEN, Xiaoling; XIAO, Yufang; GOUTOPOULOS, Andreas; LAN, Ruoxi; PERREY, David; VANDEVEER, Harold, George; LIU-BUJALSKI, Lesley; STIEBER, Frank; HODOUS, Brian L.; QIU, Hui; JONES, Reinaldo C.; HEASLEY, Brian
Patent: WO2010/93419 A1, 2010 ;
Location in patent: Page/Page column 173; 194 ;
WO 2010/093419 A1
反应条件
1.1: 4 h / 140 °C 2.1: ammonium hydroxide; ammonium acetate / 2 h / 80 °C 2.2: 72 h / 80 °C / pressure bottle 3.1: sulfuric acid / Inert atmosphere; Reflux View Scheme
反应条件
1.1: ammonium hydroxide; ammonium acetate / 2 h / 80 °C 1.2: 72 h / 80 °C / pressure bottle 2.1: sulfuric acid / Inert atmosphere; Reflux View Scheme
反应条件
1: With N-benzyl-N,N,N-triethylammonium chloride; N,N-dimethyl-aniline; trichlorophosphate in acetonitrile
T=50°C; Inert atmosphere;
2: With sodium hydrogencarbonate in dichloromethane
参考文献
MERCK PATENT GMBH; SUTTON, Amanda E.; RICHARDSON, Thomas E.; HUCK, Bayard R.; KARRA, Srinivasa R.; CHEN, Xiaoling; XIAO, Yufang; GOUTOPOULOS, Andreas; LAN, Ruoxi; PERREY, David; VANDEVEER, Harold, George; LIU-BUJALSKI, Lesley; STIEBER, Frank; HODOUS, Brian L.; QIU, Hui; JONES, Reinaldo C.; HEASLEY, Brian
Patent: WO2010/93419 A1, 2010 ;
Location in patent: Page/Page column 214 ;
WO 2010/093419 A1
