反应条件
in neat (no solvent) passing Cl2 over ferrosilicon with 35-65percent Si, begin of a strongly exothermic reactn. at 200 °C, 350 °C (yields of SiCl4: 80percent), up to 600 °C (yields of SiCl4: 94percent), formation of Si2Cl6 < 450 °C (3-10percent of the amt. of SiCl4);;
参考文献
Uspekhi Khimii, , vol. 18, p. 145 - 182
Si: MVol.B, 242, page 657 - 659
Doklady Akademii Nauk SSSR, , vol. 28, p. 66 - 69
