反应条件
in gas Irradiation (UV/VIS); on photolysis (>= 300nm) of a Cl2-SiHCl3-N2-O2-mixture (0.2 Torr Cl2, 2Torr O2, 0.1 Torr SiHCl3, 700 Torr N2);; not isolated, monitoring of react. by IR;;
参考文献
Niki, H.; Maker, P. D.; Savage, C. M.; Breitenbach, L. P.; Hurley, M. D.
Journal of Physical Chemistry, 1985 , vol. 89, # 17 p. 3725 - 3729