反应条件
H2 Kinetics; byproducts: NH4Br; cold-wall reactor heated by IR lamps, ratio NH3/BBr3=3.0, NH3/H2 introducing into uppermost part, Ar satd. with BBr3 at 0°C introducing 2cm above graphite plate substrate, total gas pressure 2-12 kPa, substra te temp. 800-1200°C, 20 min; SEM;
参考文献
Materials Research Bulletin, , vol. 34, # 14 p. 2215 - 2220
