investigation of reaction of NO with Si(111) and (100) surfaces between1220-1390°C and for NO-pressures of 6E-6 to 2E-4Torr: formation of SiO and N2 at high substrate temp. and low NO pressure;; optical and scanning electron microscopy;;
参考文献
He, Da-Ren; Smith, F. W.
Surface Science, 1985 , vol. 154, p. 347 - 356
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反应条件
in dichloromethane Kinetics; excess NO; 25 °C;
参考文献
Works, Carmen F.; Ford, Peter C.
Journal of the American Chemical Society, 2000 , vol. 122, # 31 p. 7592 - 7593
