in gaseous matrix
Kinetics; react. in a discharge flow system at 223-400K, 0.4-1.5 Torr, He or N2 as carrier gas, 3 different systems: excess NO/thermal source of NO3 (NO2/O3); excess NO/discharge source of NO3 (F2/HNO3); excess NO3, discharge source; product not isolated, detd. spect.;
参考文献
Hammer, Philip D.; Dlugokencky, Edward J.; Howard, Carleton J.
Journal of Physical Chemistry, 1986 , vol. 90, # 11 p. 2491 - 2496
