反应条件
in further solvent(s) byproducts: decamethylfulvalene; Ar atmosphere, stirring in 1-methylnaphthalene (reflux (250°C), 22 h); removement of solvent (vacuum), extn. (n-hexane), dissolution of residuewith toluene, removement of solvent (vacuum), dissolution (CH2Cl2), add n. (silica gel), drying, chromy. (silica gel, 1. n-hexane ((C5(CH3)5Fe(P5)), 2. toluene, (C5(CH3)5)Os(P5));
参考文献
Chemische Berichte, , vol. 128, # 1 p. 71 - 74