hydrogen in neat (no solvent) dry solvents; degassing Mo-compd. dissolved in EtCN, placing under hydrogen (400 Torr at -196°C), stirring react. mixt. at room temperature (1 day); removal of solvent under reduced pressure, extn. (water), dissolving in MeCN, pptn. by addn. of Et2O; elem. anal.;
AlCl3, aluminium chloride; boron trichloride in toluene Reflux;
参考文献
Prasad, Kapa; Lee, George T.; Chaudhary, Apurva; Girgis, Michael J.; Streemke, James W.; Repic, Oljan
Organic Process Research and Development, 2003 , vol. 7, # 5 p. 723 - 732
