外消旋O-去甲基萘普生-d3合成路线 （共 2 条）
反应条件
water; hydrogen bromide
16 h; Reflux;
参考文献
AUSPEX PHARMACEUTICALS, INC.; RAO, Tadimeti; ZHANG, Chengzhi; GANT, Thomas, G.; SARSHAR, Sepehr
Patent: WO2010/129505 A2, 2010 ;
Location in patent: Page/Page column 38 ;
WO 2010/129505 A2
反应条件
hydrogen bromide; 1-n-butyl-3-methylimidazolium tetrafluoroborate
12 h; Heating;
参考文献
Fontana; Venegoni
Journal of Labelled Compounds and Radiopharmaceuticals, 2008 , vol. 51, # 5 p. 239 - 241
