3,3'-二辛基硅基-2,2'-联噻吩合成路线 （共 4 条）
反应条件
1: 3,3’-dibromo-2,2’-bithiophene With n-butyllithium in tetrahydrofuran; hexane 1 h; Cooling; 2: di-(n-octyl)dichlorosilane in tetrahydrofuran; hexane T=-78°C; 5 h; Inert atmosphere;
参考文献
Grisorio, Roberto; Suranna, Gian Paolo; Mastrorilli, Piero; Allegretta, Giovanni; Loiudice, Anna; Rizzo, Aurora; Gigli, Giuseppe; Manoli, Kyriaki; Magliulo, Maria; Torsi, Luisa
Journal of Polymer Science, Part A: Polymer Chemistry, 2013 , vol. 51, # 22 p. 4860 - 4872
反应条件
1.1: hydrogenchloride; acetic acid; zinc / ethanol; water / Inert atmosphere; Reflux 2.1: n-butyllithium / tetrahydrofuran; diethyl ether; hexane / 3 h / -78 °C / Inert atmosphere 2.2: -78 - 20 °C / Inert atmosphere View Scheme
参考文献
Beaujuge, Pierre M.; Tsao, Hoi Nok; Hansen, Michael Ryan; Amb, Chad M.; Risko, Chad; Subbiah, Jegadesan; Choudhury, Kaushik Roy; Mavrinskiy, Alexei; Pisula, Wojciech; Bredas, Jean-Luc; So, Franky; Muellen, Klaus; Reynolds, John R.
Journal of the American Chemical Society, 2012 , vol. 134, # 21 p. 8944 - 8957
反应条件
1.1: bromine; acetic acid / chloroform / 5 - 60 °C / Inert atmosphere 2.1: hydrogenchloride; acetic acid; zinc / ethanol; water / Inert atmosphere; Reflux 3.1: n-butyllithium / tetrahydrofuran; diethyl ether; hexane / 3 h / -78 °C / Inert atmosphere 3.2: -78 - 20 °C / Inert atmosphere View Scheme
参考文献
Beaujuge, Pierre M.; Tsao, Hoi Nok; Hansen, Michael Ryan; Amb, Chad M.; Risko, Chad; Subbiah, Jegadesan; Choudhury, Kaushik Roy; Mavrinskiy, Alexei; Pisula, Wojciech; Bredas, Jean-Luc; So, Franky; Muellen, Klaus; Reynolds, John R.
Journal of the American Chemical Society, 2012 , vol. 134, # 21 p. 8944 - 8957
反应条件
N-bromosuccinmide in chloroform T=20°C; 24 h;
参考文献
Beaujuge, Pierre M.; Pisula, Wojciech; Tsao, Hoi Nok; Ellinger, Stefan; Muellen, Klaus; Reynolds, John R.
Journal of the American Chemical Society, 2009 , vol. 131, p. 7514 - 7515
