硅醚保护产物:甲氧基-M3合成路线 （共 3 条）
反应条件
potassium hydroxide in dimethyl sulfoxide; toluene T=8 - 12°C; 2 h;
参考文献
Salman, Mohammad; Ray, Parma Chandra; Gakhedkar, Kiran Kumar; Dorwal, Harish Niranjan; Kumar, Naresh
Patent: US2004/10128 A1, 2004 ;
Location in patent: Page 3 ;
反应条件
potassium hydroxide in dimethyl sulfoxide; toluene T=5 - 8°C; 2 h;
参考文献
US2004/10128 A1, ;
Page column 2-3 ;
反应条件
1: With formic acid; sodium hydrogensulfite in denatured spirit 2 h; Heating / reflux; 2: With sodium hydroxide in denatured spirit; water T=20°C; pH=10.5; Product distribution / selectivity;
参考文献
KOPRAN RESEARCH LABORATORIES LTD
Patent: WO2007/29265 A2, 2007 ;
Location in patent: Page/Page column 10-13 ;
