in neat (no solvent) Kinetics; mixt. of Cu3Si (from self-propagation react.) and CuCl (molar ratio 1.50:1.00) manually ground at room temp. under inert atmosphere for 15 min;evacuated; outgassed in vac. for 1 h at room temp. and for 1 h at 70°C; heated to 145-210°C; detd. by X-ray diffraction; monitored by thermogravimetry;
参考文献
Gillot, B.; Souha, H.; Viale, D.
Journal of Materials Science, 1992 , vol. 27, p. 1337 - 1342
in neat (no solvent) Kinetics; mixt. of Cu3Si (from melt and annealing reacts.) and CuCl (molar ratio 1.50:1.00) manually ground at room temp. under inert atmosphere for 15 min; evacuated; outgassed in vac. for 1 h at room temp. and for 1 h at 70°C; heated to 145-230°C; detd. by X-ray diffraction; monitored by thermogravimetry;
in neat (no solvent)
Kinetics; mixt. of Cu3Si (from self-propagation react.) and CuCl (molar ratio 1.50:1.00) manually ground at room temp. under inert atmosphere for 15 min;evacuated; outgassed in vac. for 1 h at room temp. and for 1 h at 70°C; heated to 145-210°C; detd. by X-ray diffraction; monitored by thermogravimetry;
参考文献
Gillot, B.; Souha, H.; Viale, D.
Journal of Materials Science, 1992 , vol. 27, p. 1337 - 1342
in neat (no solvent)
Kinetics; Reactions at 280, 304 and 326°C.;
参考文献
Weber, Guy; Viale, Dominique; Souha, Hammou; Gillot, Bernard
Comptes Rendus de l'Academie des Sciences, Serie II: Mecanique, Physique, Chimie, Sciences de la Terre et de l'Univers, 1988 , vol. 307, p. 1155 - 1162
in neat (no solvent)
Kinetics; mixt. of Cu3Si (from melt and annealing reacts.) and CuCl (molar ratio 1.50:1.00) manually ground at room temp. under inert atmosphere for 15 min; evacuated; outgassed in vac. for 1 h at room temp. and for 1 h at 70°C; heated to 145-230°C; detd. by X-ray diffraction; monitored by thermogravimetry;
