1.1: 49 percent / formic acid; H2O / 0.33 h / 80 °C
2.1: polystyrene-based selenenyl bromide resin / CH2Cl2 / 0.33 h / 0 - 25 °C
2.2: H2O2 / tetrahydrofuran / 0.33 h / 25 °C
View Scheme
参考文献
Brown, Philip E.; Lewis, Robert A.; Waring, Mark A.
Journal of the Chemical Society, Perkin Transactions 1: Organic and Bio-Organic Chemistry (1972-1999), 1990 , # 11 p. 2979 - 2988