反应条件
in neat (no solvent) byproducts: hexamethyldisiloxane, hexamethyldisilazane, 2-phenyloxetane; Irradiation (UV/VIS); mixt. Et3SnOCH2CH2CH2Ph and (Me3Si)2NBr was UV irradiated with DRT-400 lamp for 4 h; vac. distillation;
参考文献
Rakhlin; Podgorbunskaya; Voronkov
Russian Journal of General Chemistry, 2010 , vol. 80, # 5 p. 930 - 935
