S-(三氟甲基)二苯并噻吩三氟甲基磺酸盐合成路线 （共 67 条）
反应条件
fluorine in monofluoro-trichloromethane T=0°C;
参考文献
Umemoto, Teruo; Ishihara, Sumi
Journal of the American Chemical Society, 1993 , vol. 115, # 6 p. 2156 - 2164
反应条件
1: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 2: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 3: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
反应条件
1: LiH / dimethylformamide / -60 °C 2: SbF3 / 2 h / 150 - 160 °C 3: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 4: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 5: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
反应条件
in 1,2,2-trifluoro-trichloroethane 48 h; Ambient temperature;
参考文献
Umemoto, Teruo; Ishihara, Sumi
Journal of the American Chemical Society, 1993 , vol. 115, # 6 p. 2156 - 2164
反应条件
in acetonitrile T=60°C; 1.5 h;
参考文献
Umemoto, Teruo; Ishihara, Sumi
Journal of Fluorine Chemistry, 1999 , vol. 98, # 1 p. 75 - 81
反应条件
in monofluoro-trichloromethane T=-78 - 20°C; 1 h; Yield given;
参考文献
Journal of the American Chemical Society, , vol. 115, # 6 p. 2156 - 2164
反应条件
1: 0.58 h / 264 - 282 °C 2: NaOH / methanol / 12 h / Heating 3: LiH / dimethylformamide / -60 °C 4: SbF3 / 2 h / 150 - 160 °C 5: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 6: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 7: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
反应条件
1: NaOH / methanol / 12 h / Heating 2: LiH / dimethylformamide / -60 °C 3: SbF3 / 2 h / 150 - 160 °C 4: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 5: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 6: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
反应条件
1: 86 percent / dimethylformamide / 20 - 80 °C 2: 0.58 h / 264 - 282 °C 3: NaOH / methanol / 12 h / Heating 4: LiH / dimethylformamide / -60 °C 5: SbF3 / 2 h / 150 - 160 °C 6: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 7: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 8: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
反应条件
1: 82 percent / Cl2 / CCl4 / 20 °C / Irradiation 2: 86 percent / Et3N*3HF / 9 h / 180 °C 3: 98 percent / H2O2; H2O / acetic acid / 3 h / 80 - 88 °C 4: 79 percent / H2SO4*SO3 / CH2Cl2 / 1.5 h / 20 °C 5: 92 percent / acetonitrile / 1.5 h / 60 °C View Scheme
参考文献
Journal of Fluorine Chemistry, , vol. 98, # 1 p. 75 - 81
