zinc in methanol; trifluoroacetic acid T=25°C; 0.5 h;

tri-iso-propylsilane; trifluoroacetic acid in dichloromethane; water

triethylamine in water; acetonitrile T=20°C; 2 h;

tri-iso-propylsilane in dichloromethane 1 h;

1: (AACAA)2 With hydrogenchloride; water pH=3.5; 0.166667 h; UV-irradiationPhotolysis; 2: With hydrogenchloride; water T=115°C; 10 h; 3: (9H-Fluoren-9-yl)-methyl chloroformate in acetone; pentane

1: (LGACAGL)2 With hydrogenchloride; water pH=3.5; 0.166667 h; UV-irradiationPhotolysis; 2: With hydrogenchloride; water T=115°C; 10 h; 3: (9H-Fluoren-9-yl)-methyl chloroformate in acetone; pentane

1: dichloromethane / 3 h / 10 °C 2: triethylamine / water; acetonitrile / 2 h / 20 °C View Scheme

in acetonitrile T=20°C; pH=9.2; 0.25 h; aq. borate buffer;

trifluoroacetic acid in dichloromethane T=25°C; 0.5 h;

1: N-(9-fluorenylmethoxycarbonyl)glycine With benzotriazol-1-ol; O-(1H-benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate; N-ethyl-N,N-diisopropylamine in N,N-dimethyl-formamide Wang resin; Automated synthesizer; 2: With piperidine in 1-methyl-pyrrolidin-2-one Wang resin; Automated synthesizer; 3: 9-fluorenylmethyloxycarbonyl-Cys-OH; protected (S)-2-aminopentanedioic acid Further stages;