反应条件
in neat (no solvent) byproducts: H2O; on passing dry HF-gas over oxide at 700°C, 200percent excess HF, cooling to room temp. under diminished pressure, removal of HF by passing through He;;
参考文献
Gmelin Handbook: Sc: MVol.C3, 6.2.2.1.5, page 36 - 37
Full Text Show Details
Carlson, O. N.; Schmidt, F. A.
C. A., Spedding, F. H., Daane, A. H., Rare Earths 1961, S. 77/88 1962 , vol. 56, p. 211