反应条件
1.1: toluene-4-sulfonic acid; acetic acid / 2 h / 77 - 80 °C / |Industrial scale 2.1: trichlorophosphate; triethyl amine hydrochloride / 4 h / 85 °C 3.1: triethylamine / 2 h / 80 °C 4.1: potassium fluoride / dimethyl sulfoxide / 4 h / 90 °C 5.1: sodium hydrogencarbonate; water / 4 h / 100 °C 5.2: 1.17 h / 20 °C 6.1: water; sodium hydroxide / toluene / 0.5 h / 20 °C 6.2: 0.5 h / 15 - 25 °C View Scheme
参考文献
TOYAMA CHEMICAL CO., LTD.; FUJIFILM Corporation; NAKAMURA, Kouki; MURAKAMI, Takeshi; NAITOU, Hiroyuki; HANAKI, Naoyuki; WATANABE, Katsuyuki
Patent: US2013/245264 A1, 2013 ;