in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
参考文献
Organometallics, , vol. 30, # 16 p. 4443 - 4452
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反应条件
in neat (no solvent, gas phase) determination of react.-enthalpy;;
in gas in the gas phase over the solid mixture at 1446K;;
参考文献
Zmbov, K. F.; Margrave, J. L.
Journal of Physical Chemistry, 1966 , vol. 70, p. 3379 - 3380
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Gmelin Handbook: Sc: MVol.C3, 6.1.3.1, page 17 - 17
