in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CHF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
in gaseous matrix Irradiation (UV/VIS); laser ablation of metal, co-deposition with Ar or Ne containing CDF3 at 4 K, photolysis with Hg lamp (175 W); not isolated, detected by IR;
