反应条件
in neat (no solvent) Kinetics; Irradiation (UV/VIS); laser photolysis (ArF excomer laser, 193 nm), 293-381 K, 250-760 Torr Ar or CF4; spectrophotometric monitoring (450 nm);
参考文献
Cobos, C. J.; Cobos, A. E. Croce de; Hippler, H.; Castellano, E.
Journal of Physical Chemistry, 1989 , vol. 93, # 8 p. 3089 - 3094