1-Boc-3-(氯甲基)-1H-吡咯并[2,3-b]吡啶合成路线 （共 9 条）
反应条件
tetrachloromethane; triphenylphosphine in N,N-dimethyl-formamide T=21°C; 108 h;
参考文献
Sanchez-Obregon, Ruben; Fallis, Alex G.; Szabo, Arthur G.
Canadian Journal of Chemistry, 1992 , vol. 70, # 5 p. 1531 - 1536
反应条件
in toluene T=20°C; 3 h;
参考文献
PLEXXIKON, INC.
Patent: WO2008/63888 A2, 2008 ;
Location in patent: Page/Page column 60 ;
反应条件
isobutyl chloroformate in toluene Inert atmosphere;
参考文献
ASCEPION PHARMACEUTICALS, INC.; JIANG, Shan; XING, Xinglong; WANG, Qishan; KONG, Ren
Patent: WO2011/23081 A1, 2011 ;
Location in patent: Page/Page column 54 ;
WO 2011/023081 A1
反应条件
1: 60 percent / NaBH4 / aq. ethanol / 4 h / 21 °C 2: 45 percent / Ph3P, CCl4 / dimethylformamide / 108 h / 21 °C View Scheme
参考文献
MERCK SHARP and DOHME CORP.; STACHEL, Shawn, J.; EGBERTSON, Melissa; BRNARDIC, Edward; JONES, Kristen; SANDERS, John, M.; HENZE, Darrell, A.
Patent: WO2013/176970 A1, 2013 ;
反应条件
1: 80 percent / glacial acetic acid / H2O / 16 h / 60 °C 2: 50 percent / hexamethylenetetramine, 66percent aq. propionic acid / 1.) 21 deg C, 1 h, 2.) 100 deg C, 2 h 3: 1.) NaH / 1.) HMPA, 21 deg C, 2.) HMPA, 3 h 4: 60 percent / NaBH4 / aq. ethanol / 4 h / 21 °C 5: 45 percent / Ph3P, CCl4 / dimethylformamide / 108 h / 21 °C View Scheme
参考文献
ASCEPION PHARMACEUTICALS, INC.; JIANG, Shan; XING, Xinglong; WANG, Qishan; KONG, Ren
Patent: WO2011/23081 A1, 2011 ;
WO 2011/023081 A1
反应条件
1: 1.) NaH / 1.) HMPA, 21 deg C, 2.) HMPA, 3 h 2: 60 percent / NaBH4 / aq. ethanol / 4 h / 21 °C 3: 45 percent / Ph3P, CCl4 / dimethylformamide / 108 h / 21 °C View Scheme
参考文献
ASCEPION PHARMACEUTICALS, INC.; JIANG, Shan; XING, Xinglong; WANG, Qishan; KONG, Ren
Patent: WO2011/23081 A1, 2011 ;
WO 2011/023081 A1
反应条件
1: 50 percent / hexamethylenetetramine, 66percent aq. propionic acid / 1.) 21 deg C, 1 h, 2.) 100 deg C, 2 h 2: 1.) NaH / 1.) HMPA, 21 deg C, 2.) HMPA, 3 h 3: 60 percent / NaBH4 / aq. ethanol / 4 h / 21 °C 4: 45 percent / Ph3P, CCl4 / dimethylformamide / 108 h / 21 °C View Scheme
参考文献
ASCEPION PHARMACEUTICALS, INC.; JIANG, Shan; XING, Xinglong; WANG, Qishan; KONG, Ren
Patent: WO2011/23081 A1, 2011 ;
WO 2011/023081 A1
反应条件
1: 1.) NaH / 1.) HMPA, 21 deg C, 2.) HMPA, 3 h 2: 60 percent / NaBH4 / aq. ethanol / 4 h / 21 °C 3: 45 percent / Ph3P, CCl4 / dimethylformamide / 108 h / 21 °C View Scheme
参考文献
ASCEPION PHARMACEUTICALS, INC.; JIANG, Shan; XING, Xinglong; WANG, Qishan; KONG, Ren
Patent: WO2011/23081 A1, 2011 ;
WO 2011/023081 A1
反应条件
1: 96 percent / NaI / acetone / 24 h / 21 °C
2: 1.) potassium bis(trimethylsilyl)amide / 1.) toluene, THF, HMPA, -100 to -78 deg C, 30 min, 2.) THF, -100 deg C, 3 h
3: 69 percent / hydroxylamine hydrochloride, Na acetate / aq. ethanol / 72 h / 21 °C
4: 69 percent / trifluoroacetic acid / 2 h / 21 °C
View Scheme
参考文献
Sanchez-Obregon, Ruben; Fallis, Alex G.; Szabo, Arthur G.
Canadian Journal of Chemistry, 1992 , vol. 70, # 5 p. 1531 - 1536
