KOH in melt Mg(NO3)2 was added to an eutectic melt of KNO3/LiNO3 at 350 °C, followed by a melt of SiO2 in KOH;; the pptd. prod. was either isolated by filtration of the melt through a layer of compressed quartz powder or by leaching the cooled mass with water, alcohol, or acetone;

KOH in melt MgCl2 was added to an eutectic melt of KCl/LiCl, followed by a melt of SiO2 in KOH;; the pptd. prod. was either isolated by filtration of the melt through a layer of compressed quartz powder or by leaching the cooled mass with water, alcohol, or acetone;

silicic acid in water silica sol with aq. dispersion of silicic acid heated to 60 °C, Mg(OH)2 added in small portions for 30 min, stirred for 42 h; XRD;

in neat (no solvent, solid phase) mixt. homogenized by rubbing in agate mortar for 15 min, mechanochemicaltreatment for 12 h; XRD;