3-氯-1,1,1,3-四氟丙烷合成路线 （共 36 条）
反应条件
hydrogen fluoride; antimony(V) pentachloride T=-20 - 135°C; P=16274.9 - 21446.5 Torr; Autoclave;
参考文献
Wang, Haiyou; Merkel, Daniel C.; Pokrovski, Konstantin A.; Tung, Hsueh Sung; Shankland, Ian
Patent: US2012/271070 A1, 2012 ;
Location in patent: Page/Page column 6 ;
反应条件
hydrogen fluoride; chlorine; antimony(V) pentachloride T=80 - 95°C; P=8517.48 - 10069 Torr;
参考文献
Honeywell International, Inc.
Patent: US2005/90698 A1, 2005 ;
Location in patent: Page/Page column 5 ;
反应条件
hydrogen fluoride; titanium tetrachloride T=85°C; P=6965.99 Torr; Industry scale; Product distribution / selectivity;
参考文献
Merkel, Daniel C.; Wang, Haiyou; Pokrovski, Konstantin A.; Tung, Hsueh Sung; Shankland, Ian
Patent: US2012/184786 A1, 2012 ;
Location in patent: Page/Page column 5 ;
反应条件
hydrogen fluoride; SbF5 T=120 - 121°C; P=9551.8 - 29721.1 Torr; 3.5 h; Product distribution / selectivity;
参考文献
HONEYWELL INTERNATIONAL INC.; Nair, Haridasan K.; Singh, Rajiv Ratna; Poss, Andrew Joseph; Nalewajek, David
Patent: US2013/211156 A1, 2013 ;
Location in patent: Paragraph 0033; 0034 ;
反应条件
hydrogen fluoride; titanium tetrachloride T=86°C; P=6965.99 Torr; 100 h; PressureTemperatureTimeConcentration;
参考文献
Merkel, Daniel C.; Pokrovski, Konstantin A.; Tung, Hsueh Sung
Patent: US2013/261354 A1, 2013 ;
Location in patent: Paragraph 0085; 0086; 0087 ;
反应条件
hydrogen fluoride; chlorine; antimony(V) pentachloride T=95°C; Continous process;
参考文献
HONEYWELL INTERNATIONAL INC.
Patent: WO2004/99109 A1, 2004 ;
Location in patent: Page 8 ;
反应条件
hydrogenchloride T=350°C; 1 h;
参考文献
Wang, Haiyou; Merkel, Daniel C.; Pokrovski, Konstantin A.; Tung, Hsueh Sung; Shankland, Ian
Patent: US2012/271070 A1, 2012 ;
Location in patent: Page/Page column 6 ;
反应条件
hydrogen fluoride; SbF5 T=120 - 121°C; P=9551.8 - 29721.1 Torr; 3.5 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2007/118003 A1, 2007 ;
Location in patent: Page/Page column 4-5 ;
反应条件
hydrogen fluoride; Catalyst M-Chromium oxide T=300°C;
参考文献
Honeywell International, Inc.
Patent: US2005/90698 A1, 2005 ;
Location in patent: Page/Page column 5 ;
反应条件
hydrogen fluoride T=80°C; P=775.743 Torr; 0.00127778 - 0.00761111 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2005/20862 A1, 2005 ;
Location in patent: Page 3; 4 ;
