反应条件
in gaseous matrix byproducts: NO; F atoms generated by a microwave discharge of 5percent F2 in He, further dild. by He, mixed with ND2OD gas, spectra recorded at different react. times (corresponding to mixing distances above the photon beam between 0 and 9 cm); vac. UV photoelectron spectr.;
参考文献
Baker, Jacob; Butcher, Vivienne; Dyke, John M.; Morris, Alan
Journal of the Chemical Society, Faraday Transactions, 1990 , vol. 86, # 23 p. 3843 - 3851