1,3,3,3-四氟-1-丙烯合成路线 （共 43 条）
反应条件
composition based on chromium oxide comprising 55.8percent Cr, 175 ppm Na, 5000 ppm K, 53 pp Cu, 20 ppm Zn activated at 300 deg C in a flow of nitrogen and at 335 deg C in a flow of nitrogen and HF
T=300°C; Flow reactor; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY; NAPPA, Mario, Joseph; JACKSON, Andrew
Patent: WO2010/141664 A1, 2010 ;
Location in patent: Page/Page column 11-12 ;
反应条件
fluorinated Cr2O3
T=350°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2009/270661 A1, 2009 ;
Location in patent: Page/Page column 2 ;
反应条件
hydrogen fluoride; antimony(V) pentachloride
T=0 - 700°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2005/245773 A1, 2005 ;
Location in patent: Page/Page column 4 ;
反应条件
hydrogen fluoride; antimony(V) pentachloride
T=0 - 700°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2005/245773 A1, 2005 ;
Location in patent: Page/Page column 4 ;
反应条件
hydrogen fluoride
T=275°C; Inert atmosphere;
参考文献
E. I. du Pont de Nemours and Company; Mahler, Barry Asher; Nappa, Mario Joseph
Patent: EP2634165 A2, 2013 ;
Location in patent: Paragraph 0106; 0107 ;
反应条件
hydrogen fluoride
T=325°C; Inert atmosphere; Temperature;
参考文献
E. I. du Pont de Nemours and Company; Mahler, Barry Asher; Nappa, Mario Joseph
Patent: EP2634165 A2, 2013 ;
Location in patent: Paragraph 0106; 0107 ;
反应条件
10percent CsCl/90percent MgF2 treated at 480 C
T=470°C; P=3087.28 Torr; Gas phase; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US7829748 B1, 2010 ;
Location in patent: Page/Page column 6-7 ;
反应条件
5.3percent Cr, 6.4percent Ni on AlF3
T=377°C; P=760.051 Torr; Gas phaseIndustry scale; Product distribution / selectivity;
参考文献
ARKEMA FRANCE
Patent: US2011/15452 A1, 2011 ;
Location in patent: Page/Page column 4 ;
反应条件
hydrogen fluoride; chlorine
T=300°C; Inert atmosphere;
参考文献
E. I. du Pont de Nemours and Company; Mahler, Barry Asher; Nappa, Mario Joseph
Patent: EP2634165 A2, 2013 ;
Location in patent: Paragraph 0104; 0105 ;
反应条件
10 wt FeCl3/carbon
T=350°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2009/270661 A1, 2009 ;
Location in patent: Page/Page column 2 ;
