1: 79 percent / DBN / benzene / 8 h / 20 °C 2: 67 percent / 2,4,6-trichlorobenzoyl chloride; Et3N; DMAP / tetrahydrofuran; toluene / 24 h / 90 °C 3: 90 percent / DDQ / CH2Cl2; H2O / 20 °C View Scheme

1: 77 percent / TMSCl; NaI / acetonitrile / 6 h / -20 °C 2: 79 percent / DBN / benzene / 8 h / 20 °C 3: 67 percent / 2,4,6-trichlorobenzoyl chloride; Et3N; DMAP / tetrahydrofuran; toluene / 24 h / 90 °C 4: 90 percent / DDQ / CH2Cl2; H2O / 20 °C View Scheme

1.1: 75 percent / DCC; (+)-camphorsulfonic acid; DMAP / CH2Cl2 / 48 h / 20 °C 2.1: 79 percent / aq. AcOH / tetrahydrofuran / 48 h / 80 °C 3.1: 79 percent / DCC; DMAP; (+)-comphorsulfonic acid / CH2Cl2 / 48 h / 20 °C 4.1: 96 percent / aq. AcOH / tetrahydrofuran / 3 h / 80 °C 5.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 6.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 6.2: DMAP / toluene / 24 h / 100 °C 7.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 87 percent / aq. AcOH / tetrahydrofuran / 15 h / 70 - 110 °C 2.1: 75 percent / DCC; (+)-camphorsulfonic acid; DMAP / CH2Cl2 / 48 h / 20 °C 3.1: 79 percent / aq. AcOH / tetrahydrofuran / 48 h / 80 °C 4.1: 79 percent / DCC; DMAP; (+)-comphorsulfonic acid / CH2Cl2 / 48 h / 20 °C 5.1: 96 percent / aq. AcOH / tetrahydrofuran / 3 h / 80 °C 6.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 7.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 7.2: DMAP / toluene / 24 h / 100 °C 8.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 79 percent / DCC; DMAP; (+)-comphorsulfonic acid / CH2Cl2 / 48 h / 20 °C 2.1: 96 percent / aq. AcOH / tetrahydrofuran / 3 h / 80 °C 3.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 4.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 4.2: DMAP / toluene / 24 h / 100 °C 5.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 1.2: DMAP / toluene / 24 h / 100 °C 2.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 79 percent / aq. AcOH / tetrahydrofuran / 48 h / 80 °C 2.1: 79 percent / DCC; DMAP; (+)-comphorsulfonic acid / CH2Cl2 / 48 h / 20 °C 3.1: 96 percent / aq. AcOH / tetrahydrofuran / 3 h / 80 °C 4.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 5.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 5.2: DMAP / toluene / 24 h / 100 °C 6.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 2.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 2.2: DMAP / toluene / 24 h / 100 °C 3.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 96 percent / aq. AcOH / tetrahydrofuran / 3 h / 80 °C 2.1: Zn dust; aq. AcOH-AcONa buffer / tetrahydrofuran / 2.5 h / 20 °C 3.1: 2,4,6-trichlorbenzoyl chloride; 4A mol sieves; Et3N / 3 h / 20 °C 3.2: DMAP / toluene / 24 h / 100 °C 4.1: 75 percent / AlCl3; m-xylene / CH2Cl2 / 2 h / 0 °C View Scheme

1.1: 4-(N,N-dimethlyamino)pyridine; camphor-10-sulfonic acid; dicyclohexyl-carbodiimide / dichloromethane / 3 h / 20 °C / Inert atmosphere 2.1: methanol; pyridinium p-toluenesulfonate / 6 h / 20 °C / Inert atmosphere 3.1: 4-(N,N-dimethlyamino)pyridine; camphor-10-sulfonic acid; dicyclohexyl-carbodiimide / dichloromethane / 12 h / 20 °C / Inert atmosphere 4.1: methanol; pyridinium p-toluenesulfonate / 24 h / 20 °C / Inert atmosphere 5.1: morpholine; tetrakis(triphenylphosphine) palladium(0) / tetrahydrofuran / 12 h / 20 °C / Inert atmosphere 5.2: Inert atmosphere 6.1: 2,4,6-trichlorobenzoyl chloride; triethylamine / toluene / 1 h / 20 °C / Inert atmosphere 6.2: 7 h / 80 °C 7.1: trifluoroacetic acid / dichloromethane / 5 h / 20 °C / Inert atmosphere View Scheme