甲基三(三甲基硅氧烷基)硅烷合成路线 （共 33 条）
反应条件
1: bis-trimethylsilyl ether With methanol; sulfuric acid T=-10 - 10°C; 0.75 - 1 h; 2: monomethyl trimethoxy silane T=5 - 10°C; 0.5 - 1.75 h; 3: With water T=5 - 25°C; 4 h;
参考文献
SHIN-ETSU CHEMICAL CO., LTD.
Patent: EP1481979 A1, 2004 ;
Location in patent: Page column 7-9 ;
反应条件
water in water hydrolysis of a mixt. of (CH3)SiCl3 and (CH3)3SiCl (0.67:2.69 mol) with H2O at 32°C (max.);;
参考文献
US2469888 , ;
US2469890 , ;
C. A., , p. 6220
反应条件
NaOH in sodium hydroxide; ethanol aq. NaOH; stirring of a mixt. of (CH3)Si(OC2H5)3 and (CH3)3Si(OC2H5) (1:3 mol) with ethanol and dild. aq. NaOH; boiling of the oily product with 20percent aq. HCl;;
参考文献
Wright, N.; Hunter, M. J.
Journal of the American Chemical Society, 1947 , vol. 69, p. 803 - 809
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Gmelin Handbook: Si: MVol.C, 107, page 296 - 298
反应条件
1: bis-trimethylsilyl ether With methanol; sulfuric acid T=5 - 10°C; 1 h; 2: monomethyl trimethoxy silane T=5 - 10°C; 1.5 - 1.75 h; 3: With sulfuric acid; water Product distribution / selectivity; more than 3 stages;
参考文献
Shin-Etsu Chemical Co., Ltd.
Patent: EP1510520 A1, 2005 ;
Location in patent: Page/Page column 10-11 ;
反应条件
water T=32°C; Behandlung des Reaktionsprodukts mit konz.H2SO4;
参考文献
US2469888 , ;
US2469890 , ;
Journal of the American Chemical Society, , vol. 68, p. 360,363
反应条件
tetrachlorosilane; sulfuric acid
参考文献
Journal fuer Praktische Chemie (Leipzig), , vol. <4>9, p. 63,67,70
反应条件
hexane Behandlung des Reaktionsprodukts mit konz.H2SO4;
参考文献
Journal of the American Chemical Society, , vol. 68, p. 963
反应条件
sodium hydroxide; ethanol Kochen des Reaktionsprodukts mit 20prozentig.wss.HCl;
参考文献
Journal of the American Chemical Society, , vol. 69, p. 806,807
反应条件
sodium chloride in toluene T=20°C; 27 h; Yield given. Yields of byproduct given;
参考文献
J. Gen. Chem. USSR (Engl. Transl.), , vol. 61, # 3.2 p. 762 - 769,692 - 697
反应条件
sulfuric acid T=20 - 25°C; 3 h; Product distribution / selectivity;
参考文献
EP1510520 A1, ;
Page/Page column 10 ;
