1,1,1,2,2-五氟丙烷合成路线 （共 55 条）
反应条件
1: T=50 - 60°C; P=925.543 - 5931.67 Torr; 2: With potassium hydroxide in water T=50°C; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2006/258891 A1, 2006 ;
Location in patent: Page/Page column 3-4 ;
反应条件
hydrogen fluoride; SbF5 T=-40 - 23°C; P=1846.09 - 2052.96 Torr; 2 h; Inert atmosphere; ConcentrationTemperaturePressure;
参考文献
E. I. du Pont de Nemours and Company; Mahler, Barry Asher; Nappa, Mario Joseph
Patent: EP2634165 A2, 2013 ;
Location in patent: Paragraph 0109; 0110; 0111; 0112 ;
反应条件
hydrogen; potassium acetate; palladium 10 on activated carbon in ethanol T=120°C; P=7757.43 Torr; 16 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2008/27251 A1, 2008 ;
Location in patent: Page/Page column 3 ;
反应条件
hydrogen fluoride; Ni-Cr/AlF3 T=375°C; P=760.051 Torr; Gas phase; Product distribution / selectivity;
参考文献
Arkema France
Patent: US2011/160499 A1, 2011 ;
Location in patent: Page/Page column 5 ;
反应条件
hydrogen fluoride T=340°C; P=760.051 Torr; 86 h; Gas phase; Product distribution / selectivity;
参考文献
DAIKIN INDUSTRIES, LTD.; NOSE, Masatoshi; KOMATSU, Yuzo
Patent: WO2013/15068 A1, 2013 ;
Location in patent: Page/Page column 13-15; 18 ;
反应条件
hydrogen fluoride; Catalyst M-Chromium oxide T=365°C; P=2172.08 - 8740.03 Torr; 0.00108333 - 0.00388889 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA INC.
Patent: WO2009/3084 A1, 2008 ;
Location in patent: Page/Page column 5-6 ;
反应条件
hydrogen fluoride; TiF4 T=150°C; 5 h; Time;
参考文献
NAPPA, Mario Joseph; JACKSON, Andrew; MERKEL, Daniel C.
Patent: WO2013/71024 A1, 2013 ;
Location in patent: Paragraph 0072; 0073 ;
反应条件
composition based on chromium oxide comprising 55.8percent Cr, 175 ppm Na, 5000 ppm K, 53 pp Cu, 20 ppm Zn activated at 300 deg C in a flow of nitrogen and at 335 deg C in a flow of nitrogen and HF T=300°C; Flow reactor; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY; NAPPA, Mario, Joseph; JACKSON, Andrew
Patent: WO2010/141664 A1, 2010 ;
Location in patent: Page/Page column 11-12 ;
反应条件
hydrogen fluoride T=380°C; P=760.051 Torr; 86 h; Gas phase; Product distribution / selectivity;
参考文献
ARKEMA FRANCE; DEUR-BERT, Dominique; PIGAMO, Anne; DOUCET, Nicolas; WENDLINGER, Laurent
Patent: WO2012/98420 A1, 2012 ;
Location in patent: Page/Page column 14 ;
反应条件
hydrogen fluoride; chlorine; antimony(V) pentachloride T=78 - 91°C; P=4380.18 - 6707.41 Torr; 71 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2009/182179 A1, 2009 ;
Location in patent: Page/Page column 3-7 ;
