3-氯丙基甲基二甲氧基硅烷合成路线 （共 10 条）
反应条件
acetic acid; platinum in toluene
参考文献
Dow Corning Asia, Ltd.
Patent: US5986124 A1, 1999 ;
参考文献
Dow Corning Asia, Ltd.
Patent: US5986124 A1, 1999 ;
反应条件
bis(η4-1,5-cyclooctadiene)-di-μ-methoxy-diiridium(I) T=-78 - 80°C; pressure tight tube;
参考文献
DOW CORNING CORPORATION
Patent: WO2009/111095 A1, 2009 ;
Location in patent: Page/Page column 20 ;
参考文献
Journal of the American Chemical Society, , vol. 82, p. 3601 - 3604
参考文献
J. Gen. Chem. USSR (Engl. Transl.), , vol. 51, # 2 p. 396 - 404,322 - 329
反应条件
1: 6 h; 2: With ethanol; sodium T=80°C;
参考文献
Synthetic Communications, , vol. 31, # 18 p. 2817 - 2822
参考文献
Speier,J.L. et al.
Journal of Organic Chemistry, 1971 , vol. 36, p. 3120 - 3126
反应条件
1: 2-methyl-2-propenoic acid With potassium hydroxide in toluene 2: (3-chloropropyl)methyldimethoxysilane With 4,4'-bismethylene(2,6-di-tert-butylphenol); tetra-n-butyl phosphonium chloride in toluene; butanone T=110°C; 4 h;
参考文献
Altmann, Stefan; Pfeiffer, Juergen
Monatshefte fur Chemie, 2003 , vol. 134, # 8 p. 1081 - 1092
参考文献
Saratov, I. E.; Shpak, I. V.; Reikhsfel'd, V. O.
J. Gen. Chem. USSR (Engl. Transl.), 1981 , vol. 51, # 2 p. 396 - 404,322 - 329
反应条件
toluene-4-sulfonic acid
T=100°C; 24 h; Heating / reflux;
参考文献
Xerox Corporation
Patent: US2006/9650 A1, 2006 ;
Location in patent: Page/Page column 2; 7 ;
