1,3-辛基四甲基二硅氧烷合成路线 （共 12 条）
反应条件
phosphazene base T=150 - 190°C; P=7.50075 - 15.0015 Torr; Product distribution / selectivity;
参考文献
DOW CORNING CORPORATION
Patent: WO2008/157020 A1, 2008 ;
Location in patent: Page/Page column 16-17 ;
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107-50-62,2,4,4,6,6,8,8,10,10,12,12,14,14-十四甲基-1,3,5,7,9,11,13-七氧杂-2,4,6,8,10,12,14-七硅杂环十四烷+
反应条件
phosphazene base T=150 - 165°C; P=7.50075 Torr; Product distribution / selectivity;
参考文献
DOW CORNING CORPORATION
Patent: WO2008/157020 A1, 2008 ;
Location in patent: Page/Page column 19-21 ;
