2,6-二溴-4,4-二己基-4H-硅杂环戊二烯并[3,2-b:4,5-b’]二噻吩合成路线 （共 5 条）
反应条件
N-bromosuccinmide in N,N-dimethyl-formamide T=20°C; 0.166667 h;
参考文献
Usta, Hakan; Lu, Gang; Facchetti, Antonio; Marks, Tobin J.
Journal of the American Chemical Society, 2006 , vol. 128, # 28 p. 9034 - 9035
Title/Abstract Full Text View citing articles Show Details
Lu, Gang; Usta, Hakan; Risko, Chad; Wang, Lian; Facchetti, Antonio; Ratner, Mark A.; Marks, Tobin J.
Journal of the American Chemical Society, 2008 , vol. 130, # 24 p. 7670 - 7685
反应条件
N-bromosuccinmide in tetrahydrofuran T=20°C; 2 h;
参考文献
Kim, Ki-Won; Na, Hyungjun; So, Won-Wook; Yoon, Sung Cheol; Shin, Won Suk
Journal of Nanoscience and Nanotechnology, 2012 , vol. 12, # 5 p. 4279 - 4283
反应条件
1.1: 90 percent / zinc; HCl / ethanol; H2O; acetic acid / 2 h / Heating 2.1: n-BuLi / hexane; tetrahydrofuran / 1.5 h / -78 °C 2.2: 68 percent / hexane; tetrahydrofuran / -78 - 20 °C 3.1: 91 percent / NBS / dimethylformamide / 0.17 h / 20 °C View Scheme
参考文献
Kim, Ki-Won; Na, Hyungjun; So, Won-Wook; Yoon, Sung Cheol; Shin, Won Suk
Journal of Nanoscience and Nanotechnology, 2012 , vol. 12, # 5 p. 4279 - 4283
反应条件
1.1: 77 percent / bromine / acetic acid; CHCl3 / 30.5 h 2.1: 90 percent / zinc; HCl / ethanol; H2O; acetic acid / 2 h / Heating 3.1: n-BuLi / hexane; tetrahydrofuran / 1.5 h / -78 °C 3.2: 68 percent / hexane; tetrahydrofuran / -78 - 20 °C 4.1: 91 percent / NBS / dimethylformamide / 0.17 h / 20 °C View Scheme
参考文献
Kim, Ki-Won; Na, Hyungjun; So, Won-Wook; Yoon, Sung Cheol; Shin, Won Suk
Journal of Nanoscience and Nanotechnology, 2012 , vol. 12, # 5 p. 4279 - 4283
反应条件
1.1: n-BuLi / hexane; tetrahydrofuran / 1.5 h / -78 °C 1.2: 68 percent / hexane; tetrahydrofuran / -78 - 20 °C 2.1: 91 percent / NBS / dimethylformamide / 0.17 h / 20 °C View Scheme
参考文献
Usta, Hakan; Lu, Gang; Facchetti, Antonio; Marks, Tobin J.
Journal of the American Chemical Society, 2006 , vol. 128, # 28 p. 9034 - 9035
