二甲基(三苯基锡烷基)乙烯基硅烷合成路线 (共 1 条)
反应条件
magnesium in tetrahydrofuran byproducts: MgFCl; Schlenk technique, N2; mixt. (Mg excess) stirring for 72 h, THF vac. removal, residue extn. (Et2O), Et2O layer vac. evapn.; residue recrystn. (Et2O/n-hexane); elem. anal.;
参考文献
Hummeltenberg, Reinhard; Jurkschat, Klaus; Uhlig, Frank
Phosphorus, Sulfur and Silicon and Related Elements, 1997 , vol. 123, p. 255 - 261