2-甲基-2-丙烯酸三丁基硅烷基酯合成路线 （共 8 条）
反应条件
4-methoxy-phenol; N,N-dimethyl-formamide in n-heptane T=150 - 170°C; P=760.051 Torr; Azeotropic distillation;
参考文献
SIGMA COATINGS B.V.
Patent: EP1431301 A1, 2004 ;
Location in patent: Page 6; 7; 8 ;
反应条件
4-methoxy-phenol; formamide in n-heptane T=120 - 140°C; P=760.051 Torr; Azeotropic distillation;
参考文献
SIGMA COATINGS B.V.
Patent: EP1431301 A1, 2004 ;
Location in patent: Page 7; 8 ;
反应条件
zinc(II) chloride T=100°C; 6 h;
参考文献
Mancardi, David; Sindt, Michele; Paul, Jean-Michel; Mieloszynski, Jean-Luc
Synthetic Communications, 2007 , vol. 37, # 21 p. 3873 - 3878
反应条件
triphenylphosphine in N,N-dimethyl-formamide T=20°C; 15 h;
参考文献
Liu, Guo-Bin; Zhao, Hong-Yun; Thiemann, Thies
Synthetic Communications, 2007 , vol. 37, # 16 p. 2717 - 2727
反应条件
4-methoxy-phenol in n-heptane T=165°C; 7 h; Azeotropic distillation;
参考文献
SIGMA COATINGS B.V.
Patent: EP1431301 A1, 2004 ;
Location in patent: Page 7 ;
反应条件
4-methoxy-phenol; sulfonic acid resin Amberlyst A 15 in n-heptane
参考文献
SIGMA COATINGS B.V.
Patent: EP1431301 A1, 2004 ;
Location in patent: Page 6 ;
反应条件
Amberlyst 15 T=75°C;
参考文献
Mancardi, David; Sindt, Michele; Paul, Jean-Michel; Mieloszynski, Jean-Luc
Synthetic Communications, 2007 , vol. 37, # 21 p. 3873 - 3878
参考文献
SIGMA COATINGS B.V.
Patent: EP1295888 A1, 2003 ;
