[3-(三乙氧基硅基)丙基]氨基甲酸甲酯合成路线 （共 7 条）
反应条件
sodium methylate in methanol T=80 - 110°C; 2.21667 - 2.5 h; Conversion of starting material;
参考文献
General Electric Company
Patent: US6673954 B1, 2004 ;
Location in patent: Page column 6-9 ;
反应条件
in N,N-dimethyl-formamide
参考文献
WACKER CHEMIE AG
Patent: US2012/130103 A1, 2012 ;
Location in patent: Page/Page column 4 ;
反应条件
formic acid; sodium methylate in methanol T=130 - 214°C; P=10 - 760.051 Torr; pH=5.6 - 10; 0.5 - 1.75 h; Product distribution / selectivity;
参考文献
Childress, R. Shawn; McIntyre, James L.
Patent: US2006/235221 A1, 2006 ;
Location in patent: Page/Page column 4-5 ;
反应条件
formic acid; sodium methylate T=210°C; P=90 - 210 Torr; 1 h; Product distribution / selectivity;
参考文献
General Electric Company
Patent: US2006/276644 A1, 2006 ;
Location in patent: Page/Page column 5 ;
反应条件
T=210°C; P=100 - 300 Torr; 1.65 - 5.65 h; Product distribution / selectivity;
参考文献
General Electric Company
Patent: US7060849 B1, 2006 ;
Location in patent: Page/Page column 8 ;
反应条件
1: With iron(III) oxide T=250°C; P=750.075 Torr; Gas phaseMicrowave irradiation; 2: With Fe2O3-coated, straight-channeled cordierite T=440°C; P=750.075 Torr; Gas phase; Product distribution / selectivity;
参考文献
CONSORTIUM FOR ELEKTROCHEMISCHE INDUSTRIE GMBH
Patent: US2007/149797 A1, 2007 ;
Location in patent: Page/Page column 5-6 ;
反应条件
T=210°C; P=100 - 300 Torr; 1.65 - 5.65 h; Product distribution / selectivity;
参考文献
General Electric Company
Patent: US7060849 B1, 2006 ;
Location in patent: Page/Page column 8 ;
