in neat (no solvent) at about 60°C under pressure; further products;; condensation; removal of SiF4 by fractional sublimation; isolation by distillation with pressure;;
参考文献
Booth, H. S.; Osten, R. A.
Journal of the American Chemical Society, 1945 , vol. 67, p. 1092 - 1096
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Gmelin Handbook: Si: MVol.B, 264, page 713 - 715
