反应条件
in neat (no solvent) byproducts: CH4, H2; heating in vac. at 100°C for 4 h; filtration, washing with Et2O, drying in vac.;
参考文献
Yamamoto, Takakazu; Miyashita, Satoshi; Naito, Yoshiyuki; Komiya, Sanshiro; Ito, Takashi; Yamamoto, Akio
Organometallics, 1982 , vol. 1, p. 808 - 812