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乙二醇
甲醛
63148-62-9
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丁酮
二甲基亚砜
碳酸氢钠
471-34-1
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乙二醇
甲醛
63148-62-9
MDI
丁酮
二甲基亚砜
碳酸氢钠
471-34-1
28023-87-2
合成路线
(共 11 条)
60815-25-0
→
反应条件
28023-87-2
反应条件
boron trifluoride diethyl etherate in tetrahydrofuran; diethyl ether T=-18 - -12°C; 2.5 h;
参考文献
Kawamoto, Akira; Uda, Hisashi; Harada, Nobuyuki
Bulletin of the Chemical Society of Japan, 1980 , vol. 53, # 11 p. 3279 - 3283
10468-67-4
→
反应条件
28023-87-2
反应条件
toluene-4-sulfonic acid; 2,3-dicyano-5,6-dichloro-p-benzoquinone in benzene 4 h; Heating;
参考文献
Kawamoto, Akira; Uda, Hisashi; Harada, Nobuyuki
Bulletin of the Chemical Society of Japan, 1980 , vol. 53, # 11 p. 3279 - 3283
930-60-9
4-环戊烯-1,3-二酮
→
反应条件
28023-87-2
反应条件
1: Heating 3: 64 percent / diisobutylaluminium hydride / benzene / 0.25 h / 10 °C 4: 83 percent / Et3N / CH2Cl2 / 1 h / 0 °C 5: 16 percent / t-BuOK / tetrahydrofuran / 0.5 h / 20 °C 6: solid / 0.33 h / 15 - 20 °C / Irradiation; photolysis of benzene solution; photochemistry and rearrangements of bicyclo<3.1.0>hex-3-en-2-ones; solution photolysis, solution behavior; solid-state photolysis, crystal lattice behavior View Scheme
参考文献
Zimmerman; Sebek
Journal of the American Chemical Society, 1997 , vol. 119, # 16 p. 3677 - 3690
75011-40-4
→
反应条件
28023-87-2
反应条件
2: 64 percent / diisobutylaluminium hydride / benzene / 0.25 h / 10 °C 3: 83 percent / Et3N / CH2Cl2 / 1 h / 0 °C 4: 16 percent / t-BuOK / tetrahydrofuran / 0.5 h / 20 °C 5: solid / 0.33 h / 15 - 20 °C / Irradiation; photolysis of benzene solution; photochemistry and rearrangements of bicyclo<3.1.0>hex-3-en-2-ones; solution photolysis, solution behavior; solid-state photolysis, crystal lattice behavior View Scheme
参考文献
Zimmerman; Sebek
Journal of the American Chemical Society, 1997 , vol. 119, # 16 p. 3677 - 3690
75011-41-5
→
反应条件
28023-87-2
反应条件
1: 64 percent / diisobutylaluminium hydride / benzene / 0.25 h / 10 °C 2: 83 percent / Et3N / CH2Cl2 / 1 h / 0 °C 3: 16 percent / t-BuOK / tetrahydrofuran / 0.5 h / 20 °C 4: solid / 0.33 h / 15 - 20 °C / Irradiation; photolysis of benzene solution; photochemistry and rearrangements of bicyclo<3.1.0>hex-3-en-2-ones; solution photolysis, solution behavior; solid-state photolysis, crystal lattice behavior View Scheme
参考文献
Zimmerman; Sebek
Journal of the American Chemical Society, 1997 , vol. 119, # 16 p. 3677 - 3690
908093-98-1
→
反应条件
28023-87-2
反应条件
1: Heating 3: 64 percent / diisobutylaluminium hydride / benzene / 0.25 h / 10 °C 4: 83 percent / Et3N / CH2Cl2 / 1 h / 0 °C 5: 16 percent / t-BuOK / tetrahydrofuran / 0.5 h / 20 °C 6: solid / 0.33 h / 15 - 20 °C / Irradiation; photolysis of benzene solution; photochemistry and rearrangements of bicyclo<3.1.0>hex-3-en-2-ones; solution photolysis, solution behavior; solid-state photolysis, crystal lattice behavior View Scheme
参考文献
Zimmerman; Sebek
Journal of the American Chemical Society, 1997 , vol. 119, # 16 p. 3677 - 3690
13304-12-6
4,4-二苯基-2,5-环己二烯-1-酮
→
反应条件
28023-87-2
反应条件
sulfuric acid in diethyl ether 48 h; Heating;
参考文献
Kawamoto, Akira; Uda, Hisashi; Harada, Nobuyuki
Bulletin of the Chemical Society of Japan, 1980 , vol. 53, # 11 p. 3279 - 3283
1252686-95-5
→
反应条件
28023-87-2
+
28023-86-1
反应条件
PPh3 gold(I) chloro complex; silver trifluoromethanesulfonate in dichloromethane T=20°C; 0.0833333 h; Inert atmosphere;
参考文献
Li, Changkun; Zeng, Yi; Zhang, Hang; Feng, Jiajie; Zhang, Yan; Wang, Jianbo
Angewandte Chemie - International Edition, 2010 , vol. 49, # 36 p. 6413 - 6417
56430-16-1
→
反应条件
28023-87-2
反应条件
phosphoric acid T=150°C;
参考文献
Egli,C.
Helvetica Chimica Acta, 1975 , vol. 58, p. 104 - 110
60815-23-8
→
反应条件
28023-87-2
反应条件
1: 30 percent / Methylene Blue, O2 / CHCl3 / 2.5 h / Ambient temperature; Irradiation 2: 70 percent / concd H2SO4 / diethyl ether / 48 h / Heating View Scheme
参考文献
Kawamoto, Akira; Uda, Hisashi; Harada, Nobuyuki
Bulletin of the Chemical Society of Japan, 1980 , vol. 53, # 11 p. 3279 - 3283
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