in toluene Schlenk techniques used; protective gas: N2; detailed description given; to stirred soln. of W(CO)3PMTA in toluene, BF3*OEt2 was added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;
参考文献
Zanotti, Valerio; Rutar, V.; Angelici, Robert J.
Journal of Organometallic Chemistry, 1991 , vol. 414, # 2 p. 177 - 191
in tetrahydrofuran Schlenk techniques used; protective gas: N2; detailed description given; to stirred suspension of W(CO)3PMTA in THF, p-xylene and BF3*OEt2 were added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;
参考文献
Zanotti, Valerio; Rutar, V.; Angelici, Robert J.
Journal of Organometallic Chemistry, 1991 , vol. 414, # 2 p. 177 - 191
in tetrahydrofuran Schlenk techniques used; protective gas: N2; detailed description given; to stirred suspension of W(CO)3PMTA in THF, Me6C6 and BF3*OEt2 were added; reflux (2 h); cooling to room temp.;; filtration; evapn. to dryness; filtration of residue (through alumina/CH2Cl2 - hexane 1:4); evapn. to dryness; recrystn. (CH2Cl2/pentane/-20°C);;
参考文献
Zanotti, Valerio; Rutar, V.; Angelici, Robert J.
Journal of Organometallic Chemistry, 1991 , vol. 414, # 2 p. 177 - 191
