5-甲基己基-2-丁烯酸乙酯合成路线 （共 21 条）
反应条件
n-butyllithium; diisopropylamine Yield given. Multistep reaction;
参考文献
Tay, M. K.; About-Jaudet, E.; Collignon, N.; Teulade, M. P.; Savignac, Ph.
Synthetic Communications, 1988 , vol. 18, # 12 p. 1349 - 1362
参考文献
Miyaura,N. et al.
Tetrahedron Letters, 1977 , # 38 p. 3369 - 3370
反应条件
1.1: triethylamine / dichloromethane / Reflux 2.1: sodium chloride / water; dimethyl sulfoxide / 8 h / 145 - 155 °C 3.1: hydrazine hydrate / ethanol / 4 h / Reflux 4.1: hydrogenchloride; sodium nitrite / water / 1.5 h / 55 - 60 °C 4.2: pH 12 5.1: water; hydrogen bromide / 5 h / 100 - 110 °C View Scheme
反应条件
1.1: 1,8-diazabicyclo[5.4.0]undec-7-ene / 6 h / 0 - 20 °C / Inert atmosphere 2.1: potassium hydroxide; water / 0 - 20 °C 2.2: Raney nickel / 20 °C / 2585.81 Torr 2.3: 0 - 3 °C / pH 7 3.1: (S)-α-hydroxybenzeneacetic acid / isopropyl alcohol; water / Resolution of racemate View Scheme
反应条件
palladium monocarbide in ethanol
参考文献
Toyama Chemical Co., Ltd.
Patent: US6384065 B1, 2002 ;
反应条件
lithium hydroxide in tetrahydrofuran; water
参考文献
Hanessian, Stephen; Moitessier, Nicolas; Cantin, Louis-David
Tetrahedron, 2001 , vol. 57, # 32 p. 6885 - 6900
反应条件
N,N,N',N'-tetramethylguanidine 48 h; Ambient temperature;
参考文献
Andruszkiewicz; Silverman
Synthesis, 1989 , # 12 p. 953 - 955
反应条件
1: 66 percent / TMG / 48 h / Ambient temperature 2: H2 / 10percent Pd/C / acetic acid / Ambient temperature 3: 6N aq. HCl / 3 h / Heating View Scheme
参考文献
HELVETICA INDUSTRIES (P) LIMITED
Patent: US2012/142949 A1, 2012 ;
反应条件
1: 66 percent / TMG / 48 h / Ambient temperature 2: H2 / 10percent Pd/C / acetic acid / Ambient temperature 3: 6N aq. HCl / 3 h / Heating View Scheme
参考文献
HELVETICA INDUSTRIES (P) LIMITED
Patent: US2012/142949 A1, 2012 ;
反应条件
1: 66 percent / TMG / 48 h / Ambient temperature
2: H2 / 10percent Pd/C / acetic acid / Ambient temperature
3: 6N aq. HCl / 3 h / Heating
View Scheme
参考文献
HELVETICA INDUSTRIES (P) LIMITED
Patent: US2012/142949 A1, 2012 ;
