in water Kinetics; GaAs substrate with AlAs layer milled, powder treated with HF; solid analyzed with XRD, AlF(2+), Al(H2O)6(3+) and AlF(x)(H2O)(6-x)((3-x)+) species detd. with (27)Al and (19)F NMR; AsH3 detd. with chromy.;
参考文献
Voncken; Schermer; Van Niftrik; Bauhuis; Mulder; Larsen; Peters; De Bruin; Klaassen; Kelly
Journal of the Electrochemical Society, 2004 , vol. 151, # 5 p. G347-G352
in neat (no solvent) slight excess over the stoich. amt. of COF2 required; reaction mixt. heated in a stainless steel or monel cylinder at 160°C for 36 h;
in neat (no solvent) Kinetics; byproducts: CF4, CF3OF; etching of quartz plate or SiO2 film with COF2 diluted with N2, pressure150, 250 or 350 Pa; detd. by IR;
参考文献
Journal of the Electrochemical Society, , vol. 151, # 5 p. G297-G301
