2-氯-1,1,1,4,4,4-六氟-2-丁烯合成路线 （共 18 条）
反应条件
SbF3; chlorine T=95 - 155°C;
参考文献
Hooker Electrochem.Co.
Patent: US2554857 , 1947 ;
反应条件
hydrogen; K/Cu/Ni/CaF2 T=401°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: US2010/160696 A1, 2010 ;
Location in patent: Page/Page column 7-8 ;
反应条件
hydrogen; K/Cu/Ni/CaF2 T=398°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: US2010/160696 A1, 2010 ;
Location in patent: Page/Page column 5; 7 ;
反应条件
hydrogen; copper on carbon T=310 - 340°C; 0.0188889 - 0.0347222 h; Product distribution / selectivity;
参考文献
E.I.du pont de Nemours and Company
Patent: US2009/12335 A1, 2009 ;
Location in patent: Page/Page column 3 ;
参考文献
Henne; Hinkamp; Zimmerschied
Journal of the American Chemical Society, 1945 , vol. 67, p. 1908
反应条件
hydrogenchloride T=100°C;
参考文献
Haszeldine
Journal of the Chemical Society, 1952 , p. 2504,2506
Journal of the Chemical Society, 1953 , p. 1764,1765
反应条件
hydrogen; Ni/Cu/Cr/CaF2 T=307 - 425°C; Gas phase; Product distribution / selectivity;
参考文献
E.I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2009/79525 A2, 2009 ;
Location in patent: Page/Page column 14-15 ;
反应条件
potassium hydroxide T=40 - 70°C;
参考文献
Haszeldine
Journal of the Chemical Society, 1952 , p. 2504,2506
Journal of the Chemical Society, 1953 , p. 1764,1765
反应条件
hydrogen; silica gel; nickel T=449.9°C; P=1 Torr; Product distribution;
参考文献
Tomioka, Satoshi; Mori, Tohru; Ueda, Wataru; Morikawa, Yutaka; Ikawa, Tsuneo
Chemistry Letters, 1991 , # 10 p. 1825 - 1826
参考文献
Henne et al.
Journal of the American Chemical Society, 1947 , vol. 69, p. 1819
Full Text View citing articles Show Details
Hooker Electrochem.Co.
Patent: US2554857 , 1947 ;
Full Text Show Details
Henne; Finnegan
Journal of the American Chemical Society, 1949 , vol. 71, p. 298
Full Text View citing articles Show Details
Hooker Electrochem.Co.
Patent: US2436357 , 1945 ;
