6-氟苯并二氢吡喃-2-羧醛合成路线 （共 9 条）
反应条件
1: trimethyl-oxo-sulfonium iodide With sodium hydride in dimethyl sulfoxide 0.5 h; 2: 6-fluoro-3,4-dihydro-2H-1-benzopyran-2-carboxaldehyde in dichloromethane; dimethyl sulfoxide T=20 - 25°C; 1 h;
参考文献
Haldar, Pranab; Golla, China Malakondaiah; Swapna, Akula; Kumar, Karri Vijaya; Jawlekar, Suhas; Tummala, Arjun Kumar; Patro, Deepali; Yarraguntla, Sesha Reddy; Ramakrishnan, Srividya; Chimala, Venkata Ramana Reddy
Patent: US2011/250454 A1, 2011 ;
Location in patent: Page/Page column 12 ;
反应条件
1: trimethyl-sulfonium iodide With sodium hydride in dimethyl sulfoxide cooling; 2: 6-fluoro-3,4-dihydro-2H-1-benzopyran-2-carboxaldehyde in dimethyl sulfoxide T=20°C; 1 h;
参考文献
Bai, Yihui; Chen, Xinzhi
Journal of Chemical Research, 2006 , # 12 p. 807 - 808
反应条件
1.1: sodium hydride / dimethyl sulfoxide / 0.5 h 1.2: 1 h / 20 - 25 °C 2.1: isopropyl alcohol / Reflux 3.1: ammonium formate / palladium 10 on activated carbon / methanol / 3 h / Reflux View Scheme
参考文献
Haldar, Pranab; Golla, China Malakondaiah; Swapna, Akula; Kumar, Karri Vijaya; Jawlekar, Suhas; Tummala, Arjun Kumar; Patro, Deepali; Yarraguntla, Sesha Reddy; Ramakrishnan, Srividya; Chimala, Venkata Ramana Reddy
Patent: US2011/250454 A1, 2011 ;
反应条件
1: With sodium hydrogencarbonate; 2,2,6,6-tetramethyl-1-piperidinyloxy, free radical; iodine in dichloromethane
T=20°C; 0.166667 h;
2: With 2,2,6,6-tetramethyl-1-piperidinyloxy, free radical; iodine in dichloromethane
T=20 - 25°C; 24 h;
参考文献
Haldar, Pranab; Golla, China Malakondaiah; Swapna, Akula; Kumar, Karri Vijaya; Jawlekar, Suhas; Tummala, Arjun Kumar; Patro, Deepali; Yarraguntla, Sesha Reddy; Ramakrishnan, Srividya; Chimala, Venkata Ramana Reddy
Patent: US2011/250454 A1, 2011 ;
Location in patent: Page/Page column 12 ;
反应条件
1: With sodium bis(2-methoxyethoxy)aluminium dihydride in toluene
T=10 - 15°C;
2: With methanol in toluene
参考文献
TORRENT PHARMACEUTICALS LIMITED
Patent: WO2006/25070 A2, 2006 ;
Location in patent: Page/Page column 12; 16; 33 ;
反应条件
1.1: Et3N; ClCOOEt / tetrahydrofuran / 10 h / 20 °C
1.2: 90 percent / NaBH4 / tetrahydrofuran; H2O / 5 h / 20 °C
2.1: 78 percent / pyridinium chloroformate/SiO2 / CH2Cl2 / 1.5 h / 20 °C
View Scheme
参考文献
Bai, Yihui; Chen, Xinzhi
Journal of Chemical Research, 2006 , # 12 p. 807 - 808
反应条件
in diethyl ether; dichloromethane; water
参考文献
Mabire, Dominique Jean-Pierre; Venet, Marc Gaston; Coupa, Sophie; Poncelet, Alain Philippe; Lesage, Anne Simone Josephine
Patent: US2004/82592 A1, 2004 ;
反应条件
1.1: 86 percent / H2 / Pd/C / acetic acid / 70 - 80 °C / 15001.2 Torr
2.1: Et3N; ClCOOEt / tetrahydrofuran / 10 h / 20 °C
2.2: 90 percent / NaBH4 / tetrahydrofuran; H2O / 5 h / 20 °C
3.1: 78 percent / pyridinium chloroformate/SiO2 / CH2Cl2 / 1.5 h / 20 °C
View Scheme
参考文献
Bai, Yihui; Chen, Xinzhi
Journal of Chemical Research, 2006 , # 12 p. 807 - 808
反应条件
1.1: sodium hydride / dimethyl sulfoxide / 0.5 h
1.2: 1 h / 20 - 25 °C
2.1: isopropyl alcohol / Reflux
3.1: ammonium formate / palladium 10 on activated carbon / methanol / 3 h / Reflux
4.1: hydrogenchloride / methanol / 25 - 35 °C
View Scheme
参考文献
Haldar, Pranab; Golla, China Malakondaiah; Swapna, Akula; Kumar, Karri Vijaya; Jawlekar, Suhas; Tummala, Arjun Kumar; Patro, Deepali; Yarraguntla, Sesha Reddy; Ramakrishnan, Srividya; Chimala, Venkata Ramana Reddy
Patent: US2011/250454 A1, 2011 ;
