in neat (no solvent)
at normal pressure, SiF4 was passed within 3 h over SiS2 in a quartz tube, 1323-1373 K, in an Al2O3 tube lesser (F3Si)2O was formed, under dry N2; products were trapped at 195, 163 and 77 K, products were identified by IR;
参考文献
Beckers, Helmut; Buerger, Hans
Zeitschrift fur Anorganische und Allgemeine Chemie, 2001 , vol. 627, # 6 p. 1217 - 1224
