1-氯-2,2,3,3,3-五氟丙烷合成路线 （共 29 条）
反应条件
AlCl3, aluminium chloride in dichloropentafluoropropanes
T=39 - 50°C; P=4121.6 - 9862.1 Torr; 6 h; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54778 A2, 2008 ;
Location in patent: Page/Page column 13-14 ;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: US2012/108859 A1, 2012 ;
Location in patent: Page/Page column 3 ;
反应条件
hydrogen; acid treated activated carbon
T=350 - 500°C; Gas phase; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US2008/27251 A1, 2008 ;
Location in patent: Page/Page column 4 ;
反应条件
potassium chloride; diethylene glycol
参考文献
McBee et al.
Journal of the American Chemical Society, 1955 , vol. 77, p. 3149
反应条件
hydrogen; fluorided platinum on aluminum oxide
T=250°C; Product distribution / selectivity;
参考文献
E.I.DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54780 A2, 2008 ;
Location in patent: Page/Page column 21-22 ;
反应条件
hydrogen; fluorided Pd/Al2O3
T=300 - 350°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54779 A1, 2008 ;
Location in patent: Page/Page column 10-11 ;
反应条件
hydrogen fluoride; hydrogen; fluorided Pd on Al2O3
T=350°C; Product distribution / selectivity;
参考文献
E.I.DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54780 A2, 2008 ;
Location in patent: Page/Page column 20-21 ;
反应条件
AlCl3, aluminium chloride
T=-10 - 60°C; 6 h; Product distribution / selectivity;
参考文献
Sun, Xuehui; Nappa, Mario Joseph; Rao, Velliyur Nott Mallikarjuna; Petrov, Viacheslav A.; Swearingen, Ekaterina N.; Delyagina, Nina Ivanovna; Cherstkov, Victor Filippovich
Patent: US2008/27250 A1, 2008 ;
Location in patent: Page/Page column 3 ;
反应条件
AlCl3, aluminium chloride
T=-20 - 20°C; 6 h; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/27602 A2, 2008 ;
Location in patent: Page/Page column 14 ;
反应条件
hydrogen fluoride; hydrogen; fluorided Pd on Al2O3
T=350°C; Product distribution / selectivity;
参考文献
E.I.DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54780 A2, 2008 ;
Location in patent: Page/Page column 21 ;
