甲基-2-脱氧-L-赤式戊呋喃糖合成路线 （共 21 条）
反应条件
sodium hydroxide; sodium tetrahydroborate in water T=0 - 15°C; pH=10; 0.5 h;
参考文献
INALCO S.p.A.
Patent: WO2005/44832 A1, 2005 ;
Location in patent: Page/Page column 7-8 ;
反应条件
toluene-4-sulfonic acid in acetone T=20°C; 3 h;
参考文献
Ajinomoto Co., Inc.
Patent: EP1574515 A2, 2005 ;
Location in patent: Page/Page column 17 ;
反应条件
hydrogen; palladium on activated charcoal Product distribution / selectivity;
参考文献
Storer, Richard; Moussa, Adel; Wang, Jingyang; Chaudhuri, Narayan C.; Mathieu, Steven; Stewart, Alistair
Patent: US2005/59632 A1, 2005 ;
Location in patent: Page/Page column 27 ;
反应条件
hydrogenchloride T=20°C; 4 h;
参考文献
Ajinomoto Co., Inc.
Patent: EP1574515 A2, 2005 ;
Location in patent: Page/Page column 15 ;
反应条件
hydrogenchloride T=20°C; 2 h;
参考文献
Ajinomoto Co., Inc.
Patent: EP1574515 A2, 2005 ;
Location in patent: Page/Page column 15-16 ;
反应条件
hydrogenchloride T=20°C; Etherification; isomerization; 1 h;
参考文献
Zhang, Weijian; Ramasamy, Kanda S.; Averett, Devron R.
Nucleosides and Nucleotides, 1999 , vol. 18, # 11-12 p. 2357 - 2365
反应条件
Acidic conditions; Product distribution / selectivity;
参考文献
Storer, Richard; Moussa, Adel; Wang, Jingyang; Chaudhuri, Narayan C.; Mathieu, Steven; Stewart, Alistair
Patent: US2005/59632 A1, 2005 ;
Location in patent: Page/Page column 19; 20 ;
参考文献
Storer, Richard; Moussa, Adel; Wang, Jingyang; Chaudhuri, Narayan C.; Mathieu, Steven; Stewart, Alistair
Patent: US2005/59632 A1, 2005 ;
Location in patent: Page/Page column 30 ;
反应条件
1: 98 percent / imidazole / dimethylformamide / 20 °C 2: 40 percent / DIBAL-H / tetrahydrofuran / -78 °C 3: Dowex 50W-X8 resin / 40 °C View Scheme
参考文献
Cho, Bong Hwan; Kim, Jin Hwan; Jeon, Heung Bae; Kim, Kwan Soo
Tetrahedron, 2005 , vol. 61, # 18 p. 4341 - 4346
反应条件
Dowex 50W-X8 resin T=40°C;
参考文献
Cho, Bong Hwan; Kim, Jin Hwan; Jeon, Heung Bae; Kim, Kwan Soo
Tetrahedron, 2005 , vol. 61, # 18 p. 4341 - 4346
