1,1,1,3,3-五氟丙烷合成路线 （共 90 条）
反应条件
hydrogen; 1 Pd/C T=150 - 300°C; 0.5 h; Product distribution / selectivity;
参考文献
Honeywell International Inc.
Patent: US7473810 B1, 2009 ;
Location in patent: Page/Page column 5; 6 ;
反应条件
hydrogen; 0.5 Pd/C T=100 - 275°C; P=760.051 Torr; 0.00833333 h; Gas phase; Product distribution / selectivity;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2005/37743 A1, 2005 ;
Location in patent: Page/Page column 17; 19 ;
反应条件
hydrogen fluoride; 2percentCo2O3/Cr2O3, fluorided T=275°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54781 A1, 2008 ;
Location in patent: Page/Page column 18-19 ;
反应条件
hydrogen fluoride; 2percentCo2O3/Cr2O3, fluorided T=325 - 400°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54781 A1, 2008 ;
Location in patent: Page/Page column 18-19 ;
反应条件
hydrogen fluoride; chlorine; 2percentCo2O3/Cr2O3, fluorided T=300°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54782 A1, 2008 ;
Location in patent: Page/Page column 15-17 ;
反应条件
hydrogen; palladium/alumina
参考文献
Knunyants,I.L. et al.
Bulletin of the Academy of Sciences of the USSR, Division of Chemical Science (English Translation), 1960 , p. 1312 - 1317
Izvestiya Akademii Nauk SSSR, Seriya Khimicheskaya, 1960 , p. 1412 - 1418
反应条件
hydrogen fluoride; chlorine; 2percentCo2O3/Cr2O3, fluorided T=350 - 375°C; Product distribution / selectivity;
参考文献
E. I. DU PONT DE NEMOURS AND COMPANY
Patent: WO2008/54782 A1, 2008 ;
Location in patent: Page/Page column 15-17 ;
参考文献
Honeywell International Inc.
Patent: US2005/245773 A1, 2005 ;
Location in patent: Page/Page column 3 ;
反应条件
byproducts: H2; Irradiation (UV/VIS); 12 d: no addn. of (CF3)2PH to CF3CHCF2, main amt. of educts unchanged; additional formn. of 13 percent polyphosphanes and yellow inflammable ppt.; yiled of H2: 12 percent;
参考文献
Fields,R. et al.
Journal of the Chemical Society [Section] C: Organic, 1970 , p. 1370 - 1375
Full Text View citing articles Show Details
Gmelin Handbook: F: PerFHalOrg.3, 1.2, page 14 - 30
反应条件
chlorine T=20°C; 0.00166667 h; Irradiation;
参考文献
E.I. DUPONT DE NEMOURS AND COMPANY
Patent: WO2006/69105 A1, 2006 ;
Location in patent: Page/Page column 14 ;
