54509-73-8合成路线 （共 3623 条）
反应条件
T=26.9°C; P=50.3 Torr; Irradiation; Further byproducts given;
参考文献
Dobe, Sandor; Berces, Tibor; Marta, Ferenc
Acta Chimica Academiae Scientiarum Hungaricae, 1982 , vol. 111, # 1 p. 43 - 58
反应条件
T=26.9°C; P=50.3 Torr; Irradiation; Further byproducts given;
参考文献
Dobe, Sandor; Berces, Tibor; Marta, Ferenc
Acta Chimica Academiae Scientiarum Hungaricae, 1982 , vol. 111, # 1 p. 43 - 58
反应条件
T=26.9°C; P=50.3 Torr; Irradiationenergy data: ΔEexcit (C3. addition) = 27.8 kJ mol-1, ΔEexcit (C5. addition) = 26.8 kJ mol-1; var. conc., ratios, light intensity, pressure; Product distributionMechanismKinetics;
参考文献
Dobe, Sandor; Berces, Tibor; Marta, Ferenc
Acta Chimica Academiae Scientiarum Hungaricae, 1982 , vol. 111, # 1 p. 43 - 58
反应条件
cis-[Rh(acetone)2(C8H14)(P(i-Pr)3)]PF6 in tetrahydrofuran
T=40°C; Product distribution; Further Variations:Catalysts;
参考文献
Werner, Helmut; Schneider, Michael E.; Bosch, Marco; Wolf, Justin; Teuben, Jan H.; Meetsma, Auke; Troyanov, Sergei I.
Chemistry - A European Journal, 2000 , vol. 6, # 16 p. 3052 - 3059
反应条件
triethylamine in diethyl ether
T=0°C; 1 h;
参考文献
Abbott, Shaun D.; Lane-Bell, Patricia; Sidhu, Kanwar P. S.; Vederas, John C.
Journal of the American Chemical Society, 1994 , vol. 116, # 15 p. 6513 - 6520
反应条件
in presence of catalyst;
参考文献
Gmelin Handbook: B: B-Verb.9, 5.3.2, page 233 - 238
反应条件
aluminium-lt;#N!-methyl-anilidegt;
T=210°C; P=29420.3 - 39717.4 Torr;
参考文献
Stroh et al.
Angewandte Chemie, 1957 , vol. 69, p. 124,126
反应条件
bis(1,5-cyclooctadiene)nickel (0); triethylsilyl trifluoromethanesulphonate; triethylamine; diphenylcyclohexyl phosphine in toluene
T=20°C; Heck type reaction; P=760.051 Torr; 2 h;
参考文献
Matsubara, Ryosuke; Gutierrez, Alicia C.; Jamison, Timothy F.
Journal of the American Chemical Society, 2011 , vol. 133, # 47 p. 19020 - 19023
反应条件
bis(tricyclohexylphosphine)benzylidene ruthenium(IV) dichloride in dichloromethane
T=50°C; metathesis; P=7500.6 Torr; 2 h;
参考文献
Warwel, Siegfried; Bruese, Falk; Demes, Christoph; Kunz, Michael; Klaas, Mark Ruesch gen
Chemosphere, 2001 , vol. 43, # 1 p. 39 - 48
反应条件
in neat (no solvent)
SiH4 and ethylene (mol. ratio 1:3) at 450°C;;
参考文献
Gmelin Handbook: Si: MVol.C, 34, page 106 - 108
