反应条件
C2H5OH; HCl in further solvent(s) under N2, Ru complex added to Et3Al diluted with CH2Cl2, cooled to -78°C, ethanol slowly added, evapd. at 50°C, residue dissolvedin CH2Cl2, cooled to -78°C, treated with HCl; org. layer sepd., dried at -78°C, solvent evapd., recrystd. frombenzene;
参考文献
Inorganic Chemistry, , vol. 21, p. 3526 - 3534