T=200 - 250°C; P=42004.2 - 43504.4 Torr; Product distribution / selectivity;

in neat (no solvent, gas phase) byproducts: SiCl4, toluene, benzyl chloride; pyrolysis of C6H5CH2OSiCl3 and HSiCl3 (ratio 1:3) at 580°C; distn. of the condensate (110-130°C); further products: HCl2SiOSiCl2OSiCl3, HCl2Si(OSiCl2)2OSiCl3, C6H5CH2SiCl3, C6H5CH2(OSiCl2)2OSiCl3 and C6H5CH2OSiCl2OSiCl3;

in neat (no solvent) byproducts: trichloropentadienylsilane, 2,2,7.7-Cl4-1-O-2,7-Si2-6-Me-bicyclo(2.2.1)heptene; pyrolysis at 560°C in quartz flow reactor; sepn. by fractional distn.; fraction with b.p. 50-55°C/30 mm contains mixt. of HCl2Si(OSiCl2)2Cl and CH3C6H3SiCl2O;

in neat (no solvent) byproducts: (1,3-butadienyl)trichlorosilane; pyrolysis at 560°C in quartz flow reactor; sepn. by fractional distn.; fraction with b.p. 38-40°C/30 mm contains heptachlorotrisiloxane and unchanged C4H0OSiCl2 (gas chromy., mass spectroscopy);

in neat (no solvent) byproducts: 9,9-dichloro-9-silafluorene, 10,10-Cl2-9-oxa-10-sila-9,10-dihydrophenanthren; pyrolysis at 660, 680, 710, 730, 750°C in quartz flow reactor; sepn. by fractional distn.; fraction with b.p. 185-205°C contains mixt. of HCl2Si(OSiCl2)2Cl and Cl3Si(OSiCl2)2Cl;

trichlorosilane T=480°C; 0.00833333 h; other amount of HSiCl3, other temperature; Product distributionMechanism;